
Industrial 300 mm wafer processed spin qubits in natural silicon/silicon-germanium
A landmark study demonstrates fully industrialized fabrication of high-performance silicon quantum dots using 300mm semiconductor wafer processes, achieving impressive metrics including sub-2μeV charge noise, 1-second spin relaxation times, and 99% gate fidelities, while incorporating monolithic cobalt micromagnets, thus establishing a viable pathway for scaling quantum computing through existing semiconductor manufacturing infrastructure.